Semiconductor

Nano Inspection

The stage is used for the inspection equipment of inner and outer defects of Si wafer or glass substrate.

Overlay

This is the stage used in the technical equipment to detect the transverse deformation error of the pattern by using the stacked layers of the Si wafer.

Vacuum Stage

Ultra-precision vacuum stage that can be used for inspection equipment equipped with vacuum system in semiconductor process

Other inspection

This stage is used for the inspection equipment in micrometer(um) units where the defect size on the Si wafer is larger than nanometer(nm).